Introduction
TRUMASK ¢ç is alkaline developable and Negative type liquid photoresist ink for Inner layer , Lead frames and BGA.

The Characteristics of PHOTOMASTER
¤ýHigh resolution (1mil) patterning processes with high yields
  (up to 99%)
¤ýExcellent resistance to alkaline etchants and acid etchants
¤ýExcellent rheological properties
¤ýHigh hardness
Grade of PHOTOMASTER¢ç
¤ýPHOTOMASTER¢ç ND-066
   Liquid Photoimageable Etching Resist Ink for Dip Coating    Application
¤ýPHOTOMASTER¢ç NR-027
   Liquid Photoimageable Etching Resist Ink for Roller Coating    Application
PROPERTIES of PHOTOMASTER¢ç
PROPERTY VALUE REMARKS
Color Blue ¡æ Dark blue Unexposed ¡æ After exposure
Pencil Hardness H ¡æ 3H
Sensitivity 7steps/stouffer21 60mJ/cm2
Resolution 25/25 §­
Optical Film
Diffuser Film
Diffuser Plate
Prism sheet
Chemicals
Overcoat
Column Spacer
Black Matrix
Light Diffusing Agent
DFR for PDP
PCB Materials
Solder Mask Ink
Liquid Photoimageable Resist Ink
Dry Film Photo Resist
Polyimide Film